Electronic Devices Circuits Campus Interviews Online Exam Quiz
Electronic Devices Circuits Campus Interviews GK Quiz. Question and Answers related to Electronic Devices Circuits Campus Interviews. MCQ (Multiple Choice Questions with answers about Electronic Devices Circuits Campus Interviews
Process transconductance parameter is directly proportional to
Options
A : Electron mobility only
B : (Electron mobility)-1 only
C : Oxide capacitance only
D : Product of oxide capacitance and electron mobility
With the potential difference between the source and the drain kept small (VDS is small), the MOSFET behaves as a resistance whose value varies __________ with the overdrive voltage
Options
A : Linearly
B : Inversely
C : Exponentially
D : Logarithmically
Aspect ratio of the MOSFET has the units of
Options
A : No units
B : m
C : m2
D : m-1
The MOSFET transconductance parameter is the product of
Options
A : Process transconductance and inverse of aspect ratio
B : Inverse of Process transconductance and aspect ratio
C : Inverse of Process transconductance and inverse of aspect ratio
D : Process transconductance and aspect ratio
For a p channel MOSFET which of the following is not true?
Options
A : The source and drain are a p type semiconductor
B : The induced channel is p type region which is induced by applying a positive potential to the gate
C : The substrate is a n type semiconductor
D : None of the mentioned
For NMOS transistor which of the following is not true?
Options
A : The substrate is of p-type semiconductor
B : Inversion layer or induced channel is of n type
C : Threshold voltage is negative
D : None of the mentioned
The saturation current of the MOSFET is the value of the current when
Options
A : The voltage between the drain and drain becomes equal to the overdrive voltage
B : The voltage between the drain and drain becomes equal to the threshold voltage
C : The voltage between the drain and drain becomes equal to the voltage applied to the gate
D : The voltage between the drain and drain becomes equal to difference the overdrive voltage and the threshold voltage
At channel pinch off
Options
A : The width of the induced channel becomes non linear
B : The width of the induced channel becomes very large (resulting in very large resistance and very low, practically zero, current)
C : width becomes 1/e times the maximum possible width
D : The width of the induced channel becomes zero and the current saturates
The SI Units of the Process transconductance Parameter (k’) is
Options
A : V2/A
B : A/V2
C : V/A
D : A/V
When the voltage across the drain and the source (VDS) is increased from a small amount (assuming that the gate voltage, VG with respect to the source is higher than the threshold voltage, Vt), then the width of the induced channel in NMOS (assume that VDS is always small when compared to the Vov)
Options
A : Will remain as was before
B : Will become non uniform and will take a tapered shape with deepest width at the drain
C : Will become non uniform and will take a tapered shape with deepest width at the source
D : Will remain uniform but the width of the channel will increase
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